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Proceedings Paper

Application Of Electron - Optical Instruments For Measuring Small Pattern Features In Microlithography
Author(s): Reiner Plontke
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Paper Abstract

The fabrication of microelectronic components calls for efficient inspection instruments for checking the dimensional fidelity of micropatterns on masks and semiconductor wafers. The task, in particular, is to measure feature sizes from some microns down to 0,1μm and distances between line edges up to 150 mm. For solving this tasks electron microscopes are advantageous used. Recently a new precision measuring instrument has been developed by Jenoptik GmbH Jena: the ZRM 20 Electron-Beam Measuring and Inspection System. In the following a short description of the instrument will be given, in particular, of such functional subsystems, which determine the prerequisite to a high measuring accuracy and measuring speed.

Paper Details

Date Published: 15 October 1984
PDF: 6 pages
Proc. SPIE 0480, Integrated Circuit Metrology II, (15 October 1984); doi: 10.1117/12.943056
Show Author Affiliations
Reiner Plontke, Carl -Zeiss (German Democratic Republic)

Published in SPIE Proceedings Vol. 0480:
Integrated Circuit Metrology II
Diana Nyyssonen, Editor(s)

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