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Proceedings Paper

Fourier Transform Method For Optical Linewidth Measurement
Author(s): M . E. Guillaume; N. M. Noailly; J. C. Reynaud; J. L. Buevoz
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Paper Abstract

A new method for linewidth measurement on wafers is proposed. Owing to a Fourier transformation this method makes use of a good deal of the information available in the optical image. It applies in the 1 pm to 6 pm range by-passing data such as the thickness and optical index of the material being measured, provided that the line itself is less than 500 nm thick. Only the image sensor has to be calibrated i.e. no standard reference material is needed. Repeatability of linewidth measurement is within 0.01 μm, and accuracy is ± 0.5 % in the whole range of validity of the model presented.

Paper Details

Date Published: 15 October 1984
PDF: 7 pages
Proc. SPIE 0480, Integrated Circuit Metrology II, (15 October 1984); doi: 10.1117/12.943050
Show Author Affiliations
M . E. Guillaume, Centre National d'Etudes des Telecommunications, CNET, Chemin du Vieux Chene (France)
N. M. Noailly, Assistance Industrielle Dauphinoise - A.I.D. - Chemin du Vieux Chene (France)
J. C. Reynaud, Centre National d'Etudes des Telecommunications, CNET, Chemin du Vieux Chene (France)
J. L. Buevoz, Centre National d'Etudes des Telecommunications, CNET, Chemin du Vieux Chene (France)


Published in SPIE Proceedings Vol. 0480:
Integrated Circuit Metrology II
Diana Nyyssonen, Editor(s)

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