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Proceedings Paper

Fabrication Of Photoresist Masks For Submicrometer Surface Relief Gratings
Author(s): Lifeng Li; Mai Xu; George I. Stegeman; Colin T. Seaton
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Paper Abstract

A method of fabricating photoresist grating masks with Shipley's 1400 series positive photoresist by monitoring the negative first-order diffraction efficiency during the photoresist development is presented. The relationship between the monitoring curve and the mask profile evolution is examined.

Paper Details

Date Published: 10 March 1988
PDF: 11 pages
Proc. SPIE 0835, Integrated Optical Circuit Engineering V, (10 March 1988); doi: 10.1117/12.942328
Show Author Affiliations
Lifeng Li, Academia Sinica (China)
Mai Xu, Academia Sinica (China)
George I. Stegeman, University of Arizona (United States)
Colin T. Seaton, University of Arizona (United States)


Published in SPIE Proceedings Vol. 0835:
Integrated Optical Circuit Engineering V
Mark A. Mentzer, Editor(s)

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