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Proceedings Paper

Initial Operation Of A New High-Resolution Scanning Ion Microscope
Author(s): R Levi-Setti; P H La Marche; K Lam; Y L. Wang
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Paper Abstract

We describe the initial performance of the optical column and imaging instrumentation of a second-generation scanning ion microscope/microprobe. The instrument operates in the 20- 60 kV range and makes use of a Ga liquid metal ion source. High-quality secondary electron and ion images of conductors and insulators have been thus far obtained at 90 nm measured spot size. Ultimately the instrument is expected to perform secondary ion mass spectrometry, imaging, and microlithography functions in the 10 - 100 nm range of spot sizes.

Paper Details

Date Published: 18 June 1984
PDF: 9 pages
Proc. SPIE 0471, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III, (18 June 1984); doi: 10.1117/12.942327
Show Author Affiliations
R Levi-Setti, The University of Chicago (United States)
P H La Marche, The University of Chicago (United States)
K Lam, The University of Chicago (United States)
Y L. Wang, The University of Chicago (United States)


Published in SPIE Proceedings Vol. 0471:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III
Alfred Wagner, Editor(s)

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