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Proceedings Paper

An Application Of Focused Ion Beams To Electron Beam Testing Of Integrated Circuits
Author(s): J Puretz; J Orloff; L Swanson
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Paper Abstract

One of the applications of high current density, focused ion beams (FIB) that has been made possible by the advent of the liquid metal ion source (LMIS) is milling of micron sized structures. In this study we examine the prospect of using a FIB system to selectively remove the passivation layer from IC's in order to carry out quantitative voltage contrast measurements on the conductors thus exposed.

Paper Details

Date Published: 18 June 1984
PDF: 9 pages
Proc. SPIE 0471, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III, (18 June 1984); doi: 10.1117/12.942318
Show Author Affiliations
J Puretz, Oregon Graduate Center (United States)
J Orloff, Oregon Graduate Center (United States)
L Swanson, Oregon Graduate Center (United States)


Published in SPIE Proceedings Vol. 0471:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III
Alfred Wagner, Editor(s)

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