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Proceedings Paper

Grazing Incidence Reflectance Of SiC Films Produced By Plasma-Assisted Chemical Vapor Deposition
Author(s): Ritva A. M. Keski-Kuha; John F. Osantowski; Albert R. Toft; William D. Partlow
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Paper Abstract

The grazing incidence reflectance of silicon carbide films produced by plasma-assisted chemical vapor deposition has been evaluated in the spectral region from 256 to 1216 Å. The results show that reflectivities higher than conventional coatings can be obtained on coatings deposited both on silicon wafers and quartz substrates. Potential application of silicon carbide films for EUV astronomical instruments will be discussed.

Paper Details

Date Published: 9 August 1988
PDF: 4 pages
Proc. SPIE 0830, Grazing Incidence Optics for Astronomical and Laboratory Applications, (9 August 1988); doi: 10.1117/12.942196
Show Author Affiliations
Ritva A. M. Keski-Kuha, NASA Goddard Space Flight Center (United States)
John F. Osantowski, NASA Goddard Space Flight Center (United States)
Albert R. Toft, NASA Goddard Space Flight Center (United States)
William D. Partlow, Westinghouse R&D Center (United States)


Published in SPIE Proceedings Vol. 0830:
Grazing Incidence Optics for Astronomical and Laboratory Applications
C. Stuart Bowyer, Editor(s)

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