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Proceedings Paper

Optimization Algorithm And Fabrication Technique Of A Monolithic Image Plane Modulator
Author(s): Daniel Leigh; Nissim Ben-Yosef
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Paper Abstract

The Piezo-Electric Elasto-Optic (PEEO) effect was studied previously by G.Sirat, N.Ben-Yosef and Y.Fisher . The main problem is the technological one .i.e. the manufacture of the modulation array. The requirements of the array are a large number of piezoelectric elastooptic crystals vibrating at different resonant frequencies.The mono-lithic approach was introduced previously by using a configuration of three well separated electrodes . The present work will describe a fabrication technique of a Monolithic Image Plane modulator. Crystal thickness and pixel definition were optimized for maximum pixel density and minimum crosstalk.The optimization algorithm solves the acoustical wave equation with the boundary conditions for a three electrode configuration. Iterating with the length, thickness and density of the electrodes,a well defined standing wave beneath the central electrode is achieved.In order to assess the appropriate density and conversion values , the wave envelope may be graphically displayed.The common electrode deposition technique is replaced by a structural etching method . Previously a metalized electrode was used as the mass load . It is replaced by etching a quasi electrode on the crystal substrate,thus obtaining a modulated surface . The unidimensional monolithic frequency multiplexer is defined on a single intrinsic GaAs crystal.The experimental results agree with the numerical predictions.A maximum signal to noise ratio of 2.6 and a minimum band width of 49 Hz has been achieved.

Paper Details

Date Published: 19 February 1988
PDF: 7 pages
Proc. SPIE 0825, Spatial Light Modulators and Applications II, (19 February 1988); doi: 10.1117/12.941984
Show Author Affiliations
Daniel Leigh, The Hebrew University of Jerusalem (Israel)
Nissim Ben-Yosef, The Hebrew University of Jerusalem (Israel)


Published in SPIE Proceedings Vol. 0825:
Spatial Light Modulators and Applications II
Uzi Efron, Editor(s)

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