Share Email Print
cover

Proceedings Paper

Cad As The Foundation For Quality Assurance In VLSI Fabrication
Author(s): Raul Brauner; David Pollock; David Bedrosian
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Fabrication of VLSI devices with complex designs and one micron geometries presents a major challenge in the area of quality assurance. The original CAD design can be used as the reference for inspection, if a mechanism is provided for compensating for the effects of the process on the design. Using this approach, Contrex has developed a system for wafer inspection that accurately predicts the shape of a pattern in photoresist, and is able to detect defects as small as 0.3 microns.

Paper Details

Date Published: 29 June 1984
PDF: 3 pages
Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941924
Show Author Affiliations
Raul Brauner, Contrex , Inc. (United States)
David Pollock, Contrex , Inc. (United States)
David Bedrosian, Contrex , Inc. (United States)


Published in SPIE Proceedings Vol. 0470:
Optical Microlithography III: Technology for the Next Decade
Harry L. Stover, Editor(s)

© SPIE. Terms of Use
Back to Top