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Proceedings Paper

Cad As The Foundation For Quality Assurance In VLSI Fabrication
Author(s): Raul Brauner; David Pollock; David Bedrosian
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Paper Abstract

Fabrication of VLSI devices with complex designs and one micron geometries presents a major challenge in the area of quality assurance. The original CAD design can be used as the reference for inspection, if a mechanism is provided for compensating for the effects of the process on the design. Using this approach, Contrex has developed a system for wafer inspection that accurately predicts the shape of a pattern in photoresist, and is able to detect defects as small as 0.3 microns.

Paper Details

Date Published: 29 June 1984
PDF: 3 pages
Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941924
Show Author Affiliations
Raul Brauner, Contrex , Inc. (United States)
David Pollock, Contrex , Inc. (United States)
David Bedrosian, Contrex , Inc. (United States)

Published in SPIE Proceedings Vol. 0470:
Optical Microlithography III: Technology for the Next Decade
Harry L. Stover, Editor(s)

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