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Proceedings Paper

Automatic Inspection Of Contaminants On Reticles
Author(s): Masataka Shiba; Mitsuyoshi Koizumi; Teiji Katsuta
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Paper Abstract

Wafer steppers require contaminant-free reticles to assure high yield. This paper describes a new particle detection technique. A linearly polarized He-Ne laser beam scans obliquely across the reticle surface and only scattering light produced by the particles is detected by the detectors, which consist of analyzers, collection lenses, slits, and PMTs (photomultipliers). On the other hand, scattering light produced by the pattern edges on the reticle is cut off by the analyzers. Using this technique, particles as small as 2 1im on the surface of pellicle-installed reticles can be detected.

Paper Details

Date Published: 29 June 1984
PDF: 9 pages
Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941922
Show Author Affiliations
Masataka Shiba, Hitachi, Ltd. (Japan)
Mitsuyoshi Koizumi, Hitachi, Ltd. (Japan)
Teiji Katsuta, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 0470:
Optical Microlithography III: Technology for the Next Decade
Harry L. Stover, Editor(s)

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