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Proceedings Paper

Characterization Of Optical Properties Of Chromium Substrates And Linewidth Control For Mask Making
Author(s): L C Hsia
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Paper Abstract

Optical properties of thin Cr/Crx0y films sputtered on glass for photomask making are investigated using Auger spectroscopy, ellipsometry and ref lectometry techniques. The films selected for the study vary from oxygen very rich to very poor. The complex indices of refraction are derived from the ellipsometry data using metal film calculation. The reflectance is then calculated to compare with that directly measured. These comparisons are important in understanding the film properties and their application in microlithography. The optical properties are found to be closely related to the oxygen concentration and its profile in the film. Optical intensity profiles in the photoresist are calculated for various photoresist/Cr/Crx0 systems, yielding optimal conditions for min4izing resist line-width variations. An experiment is also carried out to illustrate the main points predicted by the theory.

Paper Details

Date Published: 29 June 1984
PDF: 7 pages
Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941920
Show Author Affiliations
L C Hsia, IBM Corporation (United States)

Published in SPIE Proceedings Vol. 0470:
Optical Microlithography III: Technology for the Next Decade
Harry L. Stover, Editor(s)

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