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Proceedings Paper

Multiple Layer Techniques In Optical Lithography: Applications To Fine Line Mos Production
Author(s): M A Listvan; M. Swanson; A. Wall; S A. Campbell
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Paper Abstract

The theory and practical concerns of multi-layer techniques using an anti-reflective polymer coating will be discussed. Anti Reflective Coating (ARC, Brewer Science, Inc.) was incorporated into the metal lithography process for a 1.2 micron gate CMOS prototype production line. Previously, reflections from substrate topography had caused a loss in linewidth control. These reflections were minimized by the ARC, which also restored process latitude. For the process described, ARC coating uniformity was ± nm, adhesion was good, and step coverage was seen to be adequate to 0.8 micron high verticle wall steps.

Paper Details

Date Published: 29 June 1984
PDF: 7 pages
Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941894
Show Author Affiliations
M A Listvan, Sperry Corporation (United States)
M. Swanson, Sperry Corporation (United States)
A. Wall, Sperry Corporation (United States)
S A. Campbell, Sperry Corporation (United States)

Published in SPIE Proceedings Vol. 0470:
Optical Microlithography III: Technology for the Next Decade
Harry L. Stover, Editor(s)

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