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Proceedings Paper

An Improved Alignment System For Wafer Steppers
Author(s): W R. Trutna; Mung Chen
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Paper Abstract

A diffraction grating alignment system has been demonstrated on a GCA stepper. Registration of better than 0.2 microns, 3 sigma has been achieved on NMOS production wafers.

Paper Details

Date Published: 29 June 1984
PDF: 8 pages
Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941888
Show Author Affiliations
W R. Trutna, Hewlett Packard Laboratories (United States)
Mung Chen, Hewlett Packard Company (United States)

Published in SPIE Proceedings Vol. 0470:
Optical Microlithography III: Technology for the Next Decade
Harry L. Stover, Editor(s)

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