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Proceedings Paper

Transparent And Heat-Reflecting ZnO:Al Films: Preparation And Optical Properties
Author(s): Z.-C. Jin; c. G. Granqvist
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Paper Abstract

ZnO:Al films were produced by dual-target reactive magnetron sputtering. The effects of different deposition conditions were investigated. Under optimized conditions, 0.3-pm-thick films had -1% luminous absorptance, ≈85 % thermal infrared reflectance, and a dc resistivity of ≈5 x 10-4 Ω cm. Rutherford Backscattering Spectrometry showed that the Al content was ≈2 at.%. Transmission electron microscopy showed that the crystallite size was ≈50 nm for films deposited onto unheated substrates.

Paper Details

Date Published: 12 November 1987
PDF: 8 pages
Proc. SPIE 0823, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VI, (12 November 1987); doi: 10.1117/12.941865
Show Author Affiliations
Z.-C. Jin, Chalmers University of Technology (Sweden)
c. G. Granqvist, Chalmers University of Technology (Sweden)


Published in SPIE Proceedings Vol. 0823:
Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VI
Carl M. Lampert, Editor(s)

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