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Proceedings Paper

Image Reversal Techniques With Standard Positive Photoresist
Author(s): Mary L. Long; Jeff Newman
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Paper Abstract

The basic reaction of positive photoresist involves the conversion of the dissolution inhibitor (diazoketone) to a dissolution enhancer (carboxylic acid). The novolac-type resin is basically unchanged, but its solubility is controlled by the presence of either the dissolution inhibitor or enhancer. It has been demonstrated that the dissolution enhancer can be thermally degraded, and, under the proper conditions, this degradation can lead to the reversal of the resist image. It is, of course, imperative to optimize the developer selectivity and to capitalize on the specific characteristics of common positive resists to define a production-oriented image reversal process.**

Paper Details

Date Published: 21 May 1984
PDF: 5 pages
Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); doi: 10.1117/12.941793
Show Author Affiliations
Mary L. Long, KTI Chemicals, Inc. (United States)
Jeff Newman, University of Arizona (United States)

Published in SPIE Proceedings Vol. 0469:
Advances in Resist Technology I
C. Grant Willson, Editor(s)

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