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Proceedings Paper

A New Negative/High Resolution Photoresist WX-305
Author(s): Medhat A. Toukhy; Stephen F. Marcotte
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Paper Abstract

This resist was designed to provide images of high resolution quality and adequate sensitivity to mid/near ultraviolet radiation 310-400nm. This resist is a non-swelling aqueous developable resist with superior resolution to conventional cyclized rubber resist systems. Resolution in the 1 micron region can be obtained in contact and projection exposures with WX-305.

Paper Details

Date Published: 21 May 1984
PDF: 8 pages
Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); doi: 10.1117/12.941781
Show Author Affiliations
Medhat A. Toukhy, Philip A. Hunt Chemical Corporation (United States)
Stephen F. Marcotte, Philip A. Hunt Chemical Corporation (United States)


Published in SPIE Proceedings Vol. 0469:
Advances in Resist Technology I
C. Grant Willson, Editor(s)

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