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Proceedings Paper

Polysilane Bilayer uv Lithography
Author(s): Donald C. Hofer; Robert D. Miller; C.Grant Willson
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Paper Abstract

Polysilanes are a class of Si-Si backbone polymers that have been demonstrated to function as high resolution positive resists with excellent uv sensitivity. These materials have a unique photochemistry with high quantum yields and nonlinear bleaching. Polysilanes serve as excellent RIE barriers for bilevel resist applications because a protective layer of SiO2 is formed during exposure to an oxygen plasma. Aliphatic polysilanes have been applied to full wafer mid-uv lithography with 0.75 μm resolution.

Paper Details

Date Published: 21 May 1984
PDF: 8 pages
Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); doi: 10.1117/12.941772
Show Author Affiliations
Donald C. Hofer, IBM Research Laboratory (United States)
Robert D. Miller, IBM Research Laboratory (United States)
C.Grant Willson, IBM Research Laboratory (United States)

Published in SPIE Proceedings Vol. 0469:
Advances in Resist Technology I
C. Grant Willson, Editor(s)

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