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Proceedings Paper

Recent Developments In Electron Beam Lithography
Author(s): S. Radelaar
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Paper Abstract

Electron beam pattern generators are nowadays used extensively for the production of masks and for direct writing on wafers. For obvious reasons electron beam pattern generators are optimized for integrated circuit fabrication. However there is also considerable potential for the use of electron beam lithography in other areas. In this paper recent trends in the development of electron beam pattern generators are described and the prob-lems encountered in the application of electron beam machines in other areas e.g. integrated optics are discussed.

Paper Details

Date Published: 14 October 1987
PDF: 7 pages
Proc. SPIE 0804, Advances in Image Processing, (14 October 1987); doi: 10.1117/12.941289
Show Author Affiliations
S. Radelaar, Center for Submicron Technology (The Netherlands)


Published in SPIE Proceedings Vol. 0804:
Advances in Image Processing
Andre J. Oosterlinck; Andrew G. Tescher, Editor(s)

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