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Proceedings Paper

Recent Developments In Electron Beam Lithography
Author(s): S. Radelaar
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Paper Abstract

Electron beam pattern generators are nowadays used extensively for the production of masks and for direct writing on wafers. For obvious reasons electron beam pattern generators are optimized for integrated circuit fabrication. However there is also considerable potential for the use of electron beam lithography in other areas. In this paper recent trends in the development of electron beam pattern generators are described and the problems encountered in the application of electron beam machines in other areas e.g. integrated optics are discussed.

Paper Details

Date Published: 22 September 1987
PDF: 7 pages
Proc. SPIE 0801, High Power Lasers: Sources, Laser-Material Interactions, High Excitations, and Fast Dynamics, (22 September 1987); doi: 10.1117/12.941212
Show Author Affiliations
S. Radelaar, Faculty of Applied Physics (The Netherlands)


Published in SPIE Proceedings Vol. 0801:
High Power Lasers: Sources, Laser-Material Interactions, High Excitations, and Fast Dynamics
Ernst-Wolfgang Kreutz; A. Quenzer; Dieter Schuoecker, Editor(s)

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