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Proceedings Paper

Electron Beam Testing And Its Applications To VLSI Technology
Author(s): S. V. Pabbisetty; Kumar Gavisetty; Steve Vaughan; Kendall Scott Wills
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Paper Abstract

With the recent advances in instrumentation, automation and spectrometer design, the Electron Beam Tester is fast becoming a standard tool for design verification and failure analysis of Very Large Scale Integrated Circuit (VLSI) technology products. This paper presents a brief overview of the principles of operation and a discussion of the different testing modes. The application of voltage contrast to VLSI technology is illustrated with a few typical examples taken from failure analysis and design verification stages of memory and microprocessor products. Present limitations and future trends of Electron Beam Testing are discussed.

Paper Details

Date Published: 2 February 1988
PDF: 12 pages
Proc. SPIE 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits, (2 February 1988); doi: 10.1117/12.940971
Show Author Affiliations
S. V. Pabbisetty, Texas Instruments (United States)
Kumar Gavisetty, Texas Instruments (United States)
Steve Vaughan, Texas Instruments (United States)
Kendall Scott Wills, Texas Instruments (United States)

Published in SPIE Proceedings Vol. 0795:
Characterization of Very High Speed Semiconductor Devices and Integrated Circuits
Ravinder K. Jain, Editor(s)

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