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Proceedings Paper

Sub-Micron Lithography Characterization Using An Expert System
Author(s): M. W. Cresswell; N. Pessall; R. J. Betsch; L. W. Linholm; D. J. Radack
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Paper Abstract

This paper describes a test chip, test results, rule generation techniques, and an expert system for characterizing the performance of a sub-micron lithography process. Examples of test results, data reduction techniques, and expert system output are given. The objective of this work is to develop a system for automatic process diagnosis.

Paper Details

Date Published: 17 April 1987
PDF: 8 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940439
Show Author Affiliations
M. W. Cresswell, Westinghouse Research and Development Center (United States)
N. Pessall, Westinghouse Research and Development Center (United States)
R. J. Betsch, Westinghouse Research and Development Center (United States)
L. W. Linholm, National Bureau of Standards (United States)
D. J. Radack, National Bureau of Standards (United States)


Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

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