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Proceedings Paper

Use Of Expert Systems In Photolithography
Author(s): Wendy Fong; Terry B. Cline
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Paper Abstract

Expert systems for photolithography or photolithography-related domains are being built by many semiconductor chip manufacturers, fabrication equipment manufacturers, and university groups. This paper describes several such applications for process control, diagnosis, automation, design, simulation, planning, and scheduling. Benefits and implementation issues are highlighted.

Paper Details

Date Published: 17 April 1987
PDF: 8 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940438
Show Author Affiliations
Wendy Fong, Hewlett-Packard Labs (United States)
Terry B. Cline, Hewlett-Packard Labs (United States)

Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

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