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Proceedings Paper

An Efficient Sample/Monte Carlo Methodology For Developing Robust Photolithography Processes
Author(s): Douglas S. Thompson; Francisco A. Leon; Steven G. Duvall
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Paper Abstract

The development of robust photolithography processes requires methodologies for efficiently finding operating conditions that will minimize the sensitivity of critical dimension control to the effects of inevitable manufacturing variability. Photolithography modeling coupled with a Monte Carlo sampling scheme and contemporary statistical design techniques accelerate the identification of the best operating conditions by reducing the number of needed process development experiments.

Paper Details

Date Published: 17 April 1987
PDF: 6 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940435
Show Author Affiliations
Douglas S. Thompson, Intel Corporation (United States)
Francisco A. Leon, Intel Corporation (United States)
Steven G. Duvall, Intel Corporation (United States)


Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

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