Share Email Print
cover

Proceedings Paper

Applications Of A High-Speed, High-Resolution Metrology System
Author(s): KarI L. Harris; Sakae Miyauchi; Takao Namae
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

It has been well established by previous work that high resolution electron-beam imaging is required to accurately measure dimensions near a micron and below. A brief overview of the applications for micrometrology system indicates that speed of operation or thruput is very important. A recently developed system is described which has been specifically designed for low voltage, high-speed micrometrology.

Paper Details

Date Published: 17 April 1987
PDF: 14 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940426
Show Author Affiliations
KarI L. Harris, KLA Instruments (United States)
Sakae Miyauchi, Holon Inc. (Japan)
Takao Namae, Holon Inc. (Japan)


Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

© SPIE. Terms of Use
Back to Top