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Proceedings Paper

Applications Of A High-Speed, High-Resolution Metrology System
Author(s): KarI L. Harris; Sakae Miyauchi; Takao Namae
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Paper Abstract

It has been well established by previous work that high resolution electron-beam imaging is required to accurately measure dimensions near a micron and below. A brief overview of the applications for micrometrology system indicates that speed of operation or thruput is very important. A recently developed system is described which has been specifically designed for low voltage, high-speed micrometrology.

Paper Details

Date Published: 17 April 1987
PDF: 14 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940426
Show Author Affiliations
KarI L. Harris, KLA Instruments (United States)
Sakae Miyauchi, Holon Inc. (Japan)
Takao Namae, Holon Inc. (Japan)


Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

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