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Proceedings Paper

Microscop.Yap.Piied To Cirs,Registration And Inspection
Author(s): D. Yansen; J. Sardella; F. Madison; P. Knutrud
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Paper Abstract

Realtime digital image processing of highly magnified optical images - Digital Microscopy - provides the basis for dramatic improvements in the rapid and repeatable acquisition of key process control information - CD's, registration, defect data. Metrology: Wafer and mask features down to .25u can now be repeatably measured optically. Techniques used in extending the minimum optical width measurement from ~l-1.5ji to .25|i will be discussed. Registration: Mask to wafer registration and layer to layer registration can now be measured with a standard deviation of .0033ji using box within a box or similar patterns. Inspection: High speed comparison to "golden" images stored in memory gives a quick look capability in addition to more extensive defect detection and coordinate determination capability. A variety of image processing functions will be discussed.

Paper Details

Date Published: 17 April 1987
PDF: 8 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940419
Show Author Affiliations
D. Yansen, IVS (United States)
J. Sardella, IVS (United States)
F. Madison, IVS (United States)
P. Knutrud, IVS (United States)


Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

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