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Proceedings Paper

A High Resolution Dimensional Metrology System For Masks
Author(s): H. Becker; D. Elliott; W. Hunn
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Paper Abstract

The continuous advance of microlithographic fabrication techniques into the submicron structure range requires a new generation of metrology systems to measure with an accuracy and throughput necessary for the demands of VLSI technology.

Paper Details

Date Published: 17 April 1987
PDF: 6 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940418
Show Author Affiliations
H. Becker, LEITZ, INC. (United States)
D. Elliott, LEITZ-IMS (United States)
W. Hunn, LEITZ, INC. (United States)


Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

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