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Proceedings Paper

Performance Evaluation Of A Practical 248nm Wafer Stepper
Author(s): Kenneth F. Walsh; Michael M. Dunn; David S. Holbrook; John H. Bruning
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Paper Abstract

Optical steppers are expected by many workers to be applicable to design rules below 0.5 micrometers. In 1986 workers at Bell Labs reported exposure of features below 0.5 micrometers using a GCA optical stepper, incorporating an excimer laser source and a refractive Tropel lens designed to operate at 248nm. In addition to a light source, lens, wafer chuck and stages, a practical wafer stepper must incorporate alignment systems, reticle and wafer handling and control systems. If the stepper is illuminated by an excimer laser, safety systems must also be provided for protection from laser light, toxic gasses, and high voltage. The system should also be configured to enhance usability and maintainablity. We will discuss the concept and performance of such a stepper system, with emphasis on the performance of lens and illuminator.

Paper Details

Date Published: 1 September 1987
PDF: 7 pages
Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940401
Show Author Affiliations
Kenneth F. Walsh, GCA Corporation (United States)
Michael M. Dunn, GCA Corporation (United States)
David S. Holbrook, GCA Corporation (United States)
John H. Bruning, GCA Corporation (United States)

Published in SPIE Proceedings Vol. 0774:
Lasers in Microlithography
John Samuel Batchelder; Daniel J. Ehrlich; Jeff Y. Tsao, Editor(s)

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