Share Email Print
cover

Proceedings Paper

Half-Micron KrF Excimer Laser Stepper Lithography With New Resist And Water-Soluble Contrast Enhanced Materials
Author(s): Masayuki Endo; Masaru Sasago; Yoshihiko Hirai; Kazufumi Ogawa; Takeshi Ishihara
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Half-micron patterns have been fabricated using a newly developed high-speed KrF excimer laser stepper system with new resist, NOEL (Novolak based resist for Excimer Laser), and water-soluble contrast enhanced material, WSP-EX.

Paper Details

Date Published: 1 September 1987
PDF: 9 pages
Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940399
Show Author Affiliations
Masayuki Endo, Matsushita Electric Industrial Co., Ltd. (Japan)
Masaru Sasago, Matsushita Electric Industrial Co., Ltd. (Japan)
Yoshihiko Hirai, Matsushita Electric Industrial Co., Ltd. (Japan)
Kazufumi Ogawa, Matsushita Electric Industrial Co., Ltd. (Japan)
Takeshi Ishihara, Matsushita Electric Industrial Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 0774:
Lasers in Microlithography
John Samuel Batchelder; Daniel J. Ehrlich; Jeff Y. Tsao, Editor(s)

© SPIE. Terms of Use
Back to Top