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Proceedings Paper

Photoetching Of Polymers With Excimer Lasers
Author(s): Y. S. Liu; H. S. Cole; H. R. Philipp; R. Guida
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Paper Abstract

Photoetching with excimer lasers has been studied in a variety of polymeric materials. Photoetching rates of polymers irradiated were measured at various laser wavelengths and fluences. The relationship of these results to the polymer absorption coefficient is examined. We propose that different mechanisms of photoetching may prevail, which depend on the absorption coefficient of the polymer. Potential use of this dry-etching process for lithography applications is evaluated.

Paper Details

Date Published: 1 September 1987
PDF: 5 pages
Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940398
Show Author Affiliations
Y. S. Liu, General Electric Research and Development Center (United States)
H. S. Cole, General Electric Research and Development Center (United States)
H. R. Philipp, General Electric Research and Development Center (United States)
R. Guida, General Electric Research and Development Center (United States)


Published in SPIE Proceedings Vol. 0774:
Lasers in Microlithography
John Samuel Batchelder; Daniel J. Ehrlich; Jeff Y. Tsao, Editor(s)

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