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Proceedings Paper

Advances In Excimer Laser Lithography
Author(s): Kanti Jain
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Paper Abstract

This paper reviews the rapidly emerging field of excimer laser lithography. Beginning with the first sub-micron exposures, developments in excimer laser projection printing on various commercial lithographic machines are reviewed. Recent results obtained with full-field scanning projection systems as well as step-and-repeat tools are summarized. Future directions in optical lithography are examined in view of these advances. Finally, a discussion of various key excimer laser parameters is presented from two points of view: availability, and requirements for various practical lithographic systems.

Paper Details

Date Published: 1 September 1987
PDF: 9 pages
Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940396
Show Author Affiliations
Kanti Jain, I. B. M. Corporate Headquarters (United States)

Published in SPIE Proceedings Vol. 0774:
Lasers in Microlithography
John Samuel Batchelder; Daniel J. Ehrlich; Jeff Y. Tsao, Editor(s)

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