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Proceedings Paper

Deep UV Lithography: Problems And Potential
Author(s): David A. Markle
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Paper Abstract

In recent years deep UV lithography systems have generated a great deal of interest because of their potential for a greater depth-of-focus for a given resolution. Recent experimental results have shown that 0.5 micron imaging is possible with a number of different deep UV designs. However, this does not guarantee that the next generation of optical lithography systems will operate in the deep UV. Adequate resolution is only one of many criteria that will determine the most practical approach to 0.5 micron lithography. The inherent advantages of deep UV systems may be compromised by a wide variety of difficult problems, while the performance of near UV systems may he extended further than is generally expected.

Paper Details

Date Published: 1 September 1987
PDF: 7 pages
Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940395
Show Author Affiliations
David A. Markle, Ultratech Stepper Inc. (United States)


Published in SPIE Proceedings Vol. 0774:
Lasers in Microlithography
John Samuel Batchelder; Daniel J. Ehrlich; Jeff Y. Tsao, Editor(s)

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