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Proceedings Paper

Review Of Contamination Detection On Patterned Surfaces
Author(s): J. Samuel Batchelder
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Paper Abstract

Because particulate contamination is the largest yield detractor in semiconductor fabrication, a support technology is evolving for inspecting product (patterned) wafers to identify sources of contamination. We will describe a variety of optical phenomena that are used to detect the presence of particles and some of their performance limitations. The Lloyd's mirror configuration can be used in a coincidence geometry to suppress the pattern signals; we will show performance data from a prototype of such a system. Most of the techniques we will describe rely on the particles protruding above the surrounding pattern. There are two dominant limitations to this approach. One limitation are the classes of pattern features that will be incorrectly identified as particles. The other is that semiconductor devices are becoming increasingly sensitive to particles smaller than the vertical pattern height.

Paper Details

Date Published: 1 September 1987
PDF: 5 pages
Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940381
Show Author Affiliations
J. Samuel Batchelder, IBM Watson Research Center (United States)

Published in SPIE Proceedings Vol. 0774:
Lasers in Microlithography
John Samuel Batchelder; Daniel J. Ehrlich; Jeff Y. Tsao, Editor(s)

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