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Proceedings Paper

Capabilities Of The Inspex EX2000 Patterned Wafer Inspection System
Author(s): Francis S. Maldari
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Paper Abstract

This paper describes the effects of grazing angle illumination on the particle sensitivity for small particles resting on bare silicon wafers and on patterned wafers. A mathematical model of particle illumination is used to support data gathered from the Inspex EX2000 Patterned Wafer Inspection System. A methodology is given for setting up the instrument in order to achieve maximum particle sensitivity on patterned wafers.

Paper Details

Date Published: 1 September 1987
PDF: 6 pages
Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940380
Show Author Affiliations
Francis S. Maldari, Inspex, Inc. (United States)


Published in SPIE Proceedings Vol. 0774:
Lasers in Microlithography
John Samuel Batchelder; Daniel J. Ehrlich; Jeff Y. Tsao, Editor(s)

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