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Proceedings Paper

Response Surfaces As A Tool For Optimizing Proximity Corrections
Author(s): D. H. Leebrick; T. R. Witt; O. B. Long
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Paper Abstract

Proximity correction in electron beam lithography is essential to obtain the best performance in the submicron regime. Several parameters are required to achieve good correction and their interaction is complex. This paper describes the use of response surface analysis to optimize those parameters values. The effect of individual parameters as well as the result of optimized parameters will be shown for the case of e-beam exposed optical positive resist.

Paper Details

Date Published: 30 June 1987
PDF: 6 pages
Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); doi: 10.1117/12.940367
Show Author Affiliations
D. H. Leebrick, Harris Corporation (United States)
T. R. Witt, Harris Corporation (United States)
O. B. Long, Harris Corporation (United States)


Published in SPIE Proceedings Vol. 0773:
Electron-Beam, X-Ray, and Ion-Beam Lithographies VI
Phillip D. Blais, Editor(s)

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