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Proceedings Paper

High Resolution Positive E-Beam Resist With Dry Etch Durability
Author(s): Akira Akimoto; Toru Seita; Yoshitaka Tsutsumi
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Paper Abstract

Electron beam exposure characteristics,such as sensitivity and contrast,and durability against oxygen plasma were measured with poly(1-pheny1-2.2.2-trifluoroethyl-α-chloro-acrylate) PCLTF prepared by solution free radical polymerization. New developers were examined for this type of polymer. Using mixtures of diisobutyl ketone DIBK and isopropyl alcohol IPA (35:65),PCLTF was preciously imaged at 25pc/cm2(0.5μm lines and spaces). Moreover with use of suitable mixture of diisopropyl ketone DIPK and isopropyl alcohol (35:65),the image at 8pc/cm2(1μm lines & spaces) is also possible. PCLTF was 1.5 times the high dry etching durability of PMMA against oxygen plasma,and showed considerably high contrast and fine gaps as narrow as 0.2μm.

Paper Details

Date Published: 25 August 1987
PDF: 5 pages
Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940332
Show Author Affiliations
Akira Akimoto, Toyo Soda Manufacturing Co. (Japan)
Toru Seita, Toyo Soda Manufacturing Co. (Japan)
Yoshitaka Tsutsumi, Toyo Soda Manufacturing Co. (Japan)

Published in SPIE Proceedings Vol. 0771:
Advances in Resist Technology and Processing IV
Murrae J. Bowden, Editor(s)

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