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Proceedings Paper

Application Of Halogenated Polymethylstyrenes To X-Ray Resists
Author(s): Tsuguo Yamaoka; Mitsunobu Koshiba; Yoichi Kamoshida; Hideo Takahashi; Yoshiyuki Harita
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Paper Abstract

A series of chlorinated polymethylstyrenes (CPMSs) and brominated polymethylstyrenes (BPMSs) were synthesized by anionic polymerization of methylstyrene followed by radical halogenation. Radiation chemistry of CPMSs and BPMSs were investigated using RhLa X-rays as a radiation source. Resist sensitivity of CPMSs and BPMSs increases with increases in molecular weight and halogen content up to 90 unit% of halogenation. In addition, CPMSs have higher sensitivity than BPMSs toward RhLa X-rays. Infrared spectroscopic studies of radiation induced chemical reactions of the polymers showed that X-ray radiation caused the dissociation of C-X (Cl or Br) bonds and that the dissociation was much faster for CPMSs than BPMSs in spite of lower mass absorption coefficients of CPMSs. CPMS-5 (Mw=49x104, Cl cont.=92 unit%) exhibits the highest sensitivity of 15 mJ/cm2 (Dg) while maintaining high contrast value of 1.3. The patterning tests of CPMS-5 were done with a MICRONIX MX-15 which had a palladium source. As a result, 0.6 μm resist patterns were obtained despite its penumbral blurring being 0.35 μm. It is confirmed that CPMS-5 is one of the best X-ray resists from a practical point of view.

Paper Details

Date Published: 25 August 1987
PDF: 10 pages
Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940330
Show Author Affiliations
Tsuguo Yamaoka, Chiba University (Japan)
Mitsunobu Koshiba, Japan Synthetic Rubber Co., Ltd. (Japan)
Yoichi Kamoshida, Japan Synthetic Rubber Co., Ltd. (Japan)
Hideo Takahashi, Chiba University (Japan)
Yoshiyuki Harita, Japan Synthetic Rubber Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 0771:
Advances in Resist Technology and Processing IV
Murrae J. Bowden, Editor(s)

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