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Proceedings Paper

Processing Photostructural Materials
Author(s): David J. Rosenblatt; Jay N. Zemel; Wayne E . Feely
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Paper Abstract

Results are presented on a resin system that can be crosslinked to yield 3D negative images that are thermally stable to temperatures greater than 300°C. The conditions needed to process films up to 1511m thick were studied. To produce microstructures in these thick films the exposure intensity must be controlled to allow adequate time for nitrogen gas, released by the diazoquinone sensitizer, to diffuse from the image region before super-saturation levels nucleate bubble defects.

Paper Details

Date Published: 25 August 1987
PDF: 7 pages
Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940321
Show Author Affiliations
David J. Rosenblatt, University of Pennsylvania (United States)
Jay N. Zemel, University of Pennsylvania (United States)
Wayne E . Feely, Rohm and Haas Co . (United States)


Published in SPIE Proceedings Vol. 0771:
Advances in Resist Technology and Processing IV
Murrae J. Bowden, Editor(s)

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