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Proceedings Paper

A Comparison Of The Dissolution Behavior Of Poly(P-Hydroxystyrene) With Novolac
Author(s): Michael J. Hanrahan; Kathleen S. Hollis
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Paper Abstract

An examination of the literature revealed that aqueous-processable positive-working photoresists based on novolac resins have been frequently reported, while analogous resists employing poly(p-hydroxystyrene) as the binder have not. In a functional resist formulation, poly(p-hydroxystyrene) would be expected to be similar to novolac in its development characteristics; however, this is not true. The dissolution properties of these two types of binders have been examined in order to identify the crucial differences. This paper presents the determination of the dissolution kinetic expression for both polymers. Additionally, the dissolution behavior of these materials in a resist-like environment is also discussed. From the results of our study, it can be concluded that poly(p-hydroxystyrene) does not exhibit as high a discrimination between exposed and unex-posed dissolution rates as does novolac.

Paper Details

Date Published: 25 August 1987
PDF: 8 pages
Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940317
Show Author Affiliations
Michael J. Hanrahan, Eastman Kodak Company (United States)
Kathleen S. Hollis, Eastman Kodak Company (United States)


Published in SPIE Proceedings Vol. 0771:
Advances in Resist Technology and Processing IV
Murrae J. Bowden, Editor(s)

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