Share Email Print

Proceedings Paper

High Temperature Photonegative Resists Based On Styrylpyridinium Units
Author(s): MinYu Li; Eli M. Pearce; S. Narang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Four types of condensation linear polymers containing styrylpyridine units were prepared as high temperature stable photoresists: polyester and polyurethane derived from 2,6-bis(p-hydroxystyryl) pyridine, and polyamide and polyimide derived from 2,6-bis(paminostyryl)py-ridine or 2,6-bis(p-carboxystyryl)pyridine. The polymers are thermally stable in the temperature range between 360 to 500°C except for the polyurethane. The decomposition temperature is higher for the aromatic polymers, lower for their aliphatic analogs. The polymers are photoreactive and crosslink based on the 2+2 cycloaddition mechanism under UV irradiation. The highest photosensitivity of these polymers, as measured by gel dose, is in the region of 10-40 mJ/cm2. The quantum yield of the photoreaction and the relationship of the photosensitivity with the morphology in the polymer systems were studied.

Paper Details

Date Published: 25 August 1987
PDF: 8 pages
Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940307
Show Author Affiliations
MinYu Li, Polytechnic University (United States)
Eli M. Pearce, Polytechnic University (United States)
S. Narang, SRI International (United States)

Published in SPIE Proceedings Vol. 0771:
Advances in Resist Technology and Processing IV
Murrae J. Bowden, Editor(s)

© SPIE. Terms of Use
Back to Top