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Proceedings Paper

High Temperature Photonegative Resists Based On Styrylpyridinium Units
Author(s): MinYu Li; Eli M. Pearce; S. Narang
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Paper Abstract

Four types of condensation linear polymers containing styrylpyridine units were prepared as high temperature stable photoresists: polyester and polyurethane derived from 2,6-bis(p-hydroxystyryl) pyridine, and polyamide and polyimide derived from 2,6-bis(paminostyryl)py-ridine or 2,6-bis(p-carboxystyryl)pyridine. The polymers are thermally stable in the temperature range between 360 to 500°C except for the polyurethane. The decomposition temperature is higher for the aromatic polymers, lower for their aliphatic analogs. The polymers are photoreactive and crosslink based on the 2+2 cycloaddition mechanism under UV irradiation. The highest photosensitivity of these polymers, as measured by gel dose, is in the region of 10-40 mJ/cm2. The quantum yield of the photoreaction and the relationship of the photosensitivity with the morphology in the polymer systems were studied.

Paper Details

Date Published: 25 August 1987
PDF: 8 pages
Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940307
Show Author Affiliations
MinYu Li, Polytechnic University (United States)
Eli M. Pearce, Polytechnic University (United States)
S. Narang, SRI International (United States)


Published in SPIE Proceedings Vol. 0771:
Advances in Resist Technology and Processing IV
Murrae J. Bowden, Editor(s)

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