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Proceedings Paper

New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography
Author(s): C.Grant Willson; Robert D. Miller; Dennis R. McKean; Lester A. Pederson
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Paper Abstract

The results of studies directed toward the design of diazoketone dissolution inhibitors for deep U.V. photolithography are described. This work has identified a useful chromophore, the 1,3-diacy1-2-diazo linkage which has the requisite spectral characteristics for use in the deep UV. Incorporation of appropriate hetero-atomes into the structure has allowed synthesis of analogs that survive common processing sequences. A detailed study of the photochemistry of these analogs led to an understanding of the importance of the stability of the ketene photoproduct on resist contrast. Imaging results are presented for a trilayer application and for excimer laser projection printing.

Paper Details

Date Published: 25 August 1987
PDF: 9 pages
Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940301
Show Author Affiliations
C.Grant Willson, IBM (United States)
Robert D. Miller, IBM (United States)
Dennis R. McKean, IBM (United States)
Lester A. Pederson, IBM (United States)


Published in SPIE Proceedings Vol. 0771:
Advances in Resist Technology and Processing IV
Murrae J. Bowden, Editor(s)

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