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Proceedings Paper

A High Speed, High Accuracy Lithographic Application of Argon Ion Lasers
Author(s): Joseph C. McMenamin
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Paper Abstract

A high performance scanning laser lithography system has been developed for high speed writing of reduction reticles (the master patterns used expose semiconductor wafers). This system uses an Argon fan laser operating at 363.8 nm as the exposing light source. An overview of the system's optics will be presented and the laser performance required to meet the system specifications will be discussed.

Paper Details

Date Published: 6 April 1987
PDF: 6 pages
Proc. SPIE 0737, New Developments and Applications in Gas Lasers, (6 April 1987); doi: 10.1117/12.939678
Show Author Affiliations
Joseph C. McMenamin, ATEQ Corporation (United States)


Published in SPIE Proceedings Vol. 0737:
New Developments and Applications in Gas Lasers
Lee R. Carlson, Editor(s)

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