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Proceedings Paper

Influeace Of System Aberrations On Interferometric Aspheric Surface Testing
Author(s): Hiroyuki Kurita; Keisuke Saito; Masahiko Kato; Toyohiko Yatagai
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Paper Abstract

Two important problems in interferometric aspheric surface testing are introduced and approaches for overcoming the problems are discussed. Firstly, the definition of the system aberrations of an optical system is given. The effect of system aberrations is explained by the result of computer simulations. An approach for the reduction of their influences using third order aberration representation of them is discussed. Secondly, the problem in the interpretation of an interferogram is discussed, and an interpretation method based on Huygens' principle is discussed. By the use of these methods, the influence of system aberration can be reduced, and the exact shape of aspheric surface to be tested can be obtained from the phase distributions measured.

Paper Details

Date Published: 23 March 1987
PDF: 7 pages
Proc. SPIE 0680, Surface Characterization and Testing, (23 March 1987); doi: 10.1117/12.939591
Show Author Affiliations
Hiroyuki Kurita, Olympus Optical Co (Japan)
Keisuke Saito, Olympus Optical Co (Japan)
Masahiko Kato, Olympus Optical Co (Japan)
Toyohiko Yatagai, University of Tsukuba (Japan)


Published in SPIE Proceedings Vol. 0680:
Surface Characterization and Testing
Katherine Creath, Editor(s)

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