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Proceedings Paper

Ion-Assisted Processes In Optical Thin Film Deposition
Author(s): R P Netterfield
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Paper Abstract

The microstructure, crystallinity, and stoichiometry of vacuum deposited thin films are modified substantially if the layer is bombarded by ions during growth. The properties of optical films prepared by ion-assistance are often superior to those produced in vapor deposition. These ion-induced modifications will be explained in terms of recently developed theories and computer simulations.

Paper Details

Date Published: 23 December 1986
PDF: 10 pages
Proc. SPIE 0678, Optical Thin Films II: New Developments, (23 December 1986); doi: 10.1117/12.939534
Show Author Affiliations
R P Netterfield, CSIRO (Australia )


Published in SPIE Proceedings Vol. 0678:
Optical Thin Films II: New Developments
Richard Ian Seddon, Editor(s)

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