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Proceedings Paper

Laser - Assisted Chemical Etching
Author(s): F A Houle
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Paper Abstract

Laser-induced or -enhanced chemical etching of solid surfaces has provided an important new tool in recent years for materials processing. Studies have been reported on a wide range of substrates, including semiconductors, metals, ceramics, glasses and thin organic films. In this paper the current status of the field is reviewed. Characteristics of laser etching of various materials are described. Activities related to applications and to fundamental understanding of the process are also discussed.

Paper Details

Date Published: 14 June 1984
PDF: 5 pages
Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); doi: 10.1117/12.939444
Show Author Affiliations
F A Houle, IBM Research Laboratory (United States)

Published in SPIE Proceedings Vol. 0459:
Laser-Assisted Deposition, Etching, and Doping
Susan Davis Allen, Editor(s)

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