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Proceedings Paper

Laser-Assisted Evaporations Of Dielectric And Semiconductor Materials
Author(s): H. Sankur
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Paper Abstract

Evaporation of materials by means of lasers is a technique that has reached maturity as an optical coating and semiconductor epitaxial layer growth technology and as such has been applied to a large class of materials. Using cw and pulsed CO2 lasers, several oxides, fluorides and semiconductors were deposited with good optical properties. Mixtures of the above were obtained by using multiple laser evaporation targets. The dielectric films were characterized for their optical properties and semiconductor films for their structural and electrical properties. Laser evaporation conditions and characterization results of the films will be explained.

Paper Details

Date Published: 14 June 1984
PDF: 4 pages
Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); doi: 10.1117/12.939439
Show Author Affiliations
H. Sankur, Rockwell International Science Center (United States)

Published in SPIE Proceedings Vol. 0459:
Laser-Assisted Deposition, Etching, and Doping
Susan Davis Allen, Editor(s)

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