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Proceedings Paper

Surface And Gas Processes In Photodeposition In Small Zones
Author(s): J Y Tsao; D J Ehrlich
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Paper Abstract

The kinetics of processes for laser-photochemically depositing localized thin films are discussed, both in the low-intensity regime, where photoreactions are rate limiting, and in the high-intensity regime, where mass transport is rate limiting. Comparisons are made between processes relying on gas-phase and surface-phase photochemistry. Examples are given of recent studies of photoreactions confined entirely to surface phases, and preliminary results of experiments performed in the mass-transport-limited regime are reported.

Paper Details

Date Published: 14 June 1984
PDF: 7 pages
Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); doi: 10.1117/12.939427
Show Author Affiliations
J Y Tsao, Massachusetts Institute of Technology (United States)
D J Ehrlich, Massachusetts Institute of Technology (United States)

Published in SPIE Proceedings Vol. 0459:
Laser-Assisted Deposition, Etching, and Doping
Susan Davis Allen, Editor(s)

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