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Proceedings Paper

The Application Of Small Area Electron Spectroscopy For Chemical Analysis (ESCA)
Author(s): Gerard L. Kearns
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Paper Abstract

X-ray photoelectron spectroscopy (XPS) has many virtues as a surface analytical technique especially in its ability to provide both elemental and chemical information from an unperturbed surface. Its only disadvantage has been a lack of spatial resolution limiting its compatability with other surface techniques, such as Auger (AES) and Secondary Ion Mass Spectrometer (SIMS). Small area XPS analysis has been developed for VG ESCALAB MkII in order to improve the technique's spatial resolution so that it can be combined directly with AES and SIMS in a true multi-technique approach to surface analysis. The spatial ranges of the various surface anlytical techniques listed in Table I show that conventional XPS has a narrow range of analysis area size of between 1 mm and 10 mm diameter and this range is outside the normal operating dimensions of either AES or SIMS. The aim of this small area XPS development was to extend the range of XPS downwards into the range of 100 to 1,000 microns where range of interesting surface applications. It was found that the change from conventional to small area XPS could be made rapidly on ESCALAB MkII and that the instrument's electron and ion beams could be used to define the area of XPS analysis. With the analysis conditions so well defined, three completely different samples were confidently analysed. Finally, the inherent loss of signal which results from analysing small areas has been solved by the development of multi-array detection on ESCALAB.

Paper Details

Date Published: 10 May 1984
PDF: 4 pages
Proc. SPIE 0452, Spectroscopic Characterization Techniques for Semiconductor Technology I, (10 May 1984); doi: 10.1117/12.939300
Show Author Affiliations
Gerard L. Kearns, VG Instruments (United States)

Published in SPIE Proceedings Vol. 0452:
Spectroscopic Characterization Techniques for Semiconductor Technology I
Robert S. Bauer; Fred H. Pollak, Editor(s)

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