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Proceedings Paper

Spectroscopic Techniques For Characterization Of Gas Phase Species In Plasma Etching And Vapor Deposition Processes
Author(s): Joda Wormhoudt; Alan C. Stanton; Joel A. Silver
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Paper Abstract

This paper presents a review of techniques for spectroscopic characterization of mile gas pnase species involved in vapor depositon and plasma etching, two processes of great importance in the semiconductor industry. Descriptions of the apparatus requirements and capabilities of diode laser absorption and dye laser resonance fluorescence detection techniques are given. In addition, band strength and other spectroscopic data for selected molecules are used to give estimates of the detection sensitivity for various species.

Paper Details

Date Published: 10 May 1984
PDF: 12 pages
Proc. SPIE 0452, Spectroscopic Characterization Techniques for Semiconductor Technology I, (10 May 1984); doi: 10.1117/12.939293
Show Author Affiliations
Joda Wormhoudt, Aerodyne Research, Inc. (United States)
Alan C. Stanton, Aerodyne Research, Inc. (United States)
Joel A. Silver, Aerodyne Research, Inc. (United States)


Published in SPIE Proceedings Vol. 0452:
Spectroscopic Characterization Techniques for Semiconductor Technology I
Robert S. Bauer; Fred H. Pollak, Editor(s)

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