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Proceedings Paper

B-Si masks for storage ring X-ray lithography
Author(s): R. E. Acosta; J R Maldonado; L K. Towart; J M Warlaumont
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Paper Abstract

The fabrication of masks used in storage ring X-ray lithography is described. These masks consist of a gold absorber electroplated over a substrate formed by a thin boron-doped silicon membrane covered by a layer of polyimide. Measurement of the properties of the materials which are of concern in this application is also described.

Paper Details

Date Published: 19 March 1984
PDF: 5 pages
Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); doi: 10.1117/12.939214
Show Author Affiliations
R. E. Acosta, IBM Thomas J. Watson Research Center (United States)
J R Maldonado, IBM Thomas J. Watson Research Center (United States)
L K. Towart, IBM Thomas J. Watson Research Center (United States)
J M Warlaumont, IBM Thomas J. Watson Research Center (United States)


Published in SPIE Proceedings Vol. 0448:
X-Ray Lithography and Applications of Soft X-Rays to Technology
Alan D. Wilson, Editor(s)

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