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Proceedings Paper

An X-Ray Stepper
Author(s): E Cullmann
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Paper Abstract

With design rules for highly integrated circuits approaching or even attaining the sub-micron range, a mask aligner which is not working near its resolution limit is needed in order to provide enough process latitude. A candidate for this kind of machine is an x-ray stepper operating at a safe gap between mask and wafer and using a synchrotron radiation source. A mechanical stepping system, a gap setting mecnanism and an autoalignment scheme, in addition to the adaptation to synchrotron sources are described. An outlook on the economical advantages of this kind of lithography versus optical steppers is given.

Paper Details

Date Published: 19 March 1984
PDF: 4 pages
Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); doi: 10.1117/12.939212
Show Author Affiliations
E Cullmann, Karl Suss (Germany)


Published in SPIE Proceedings Vol. 0448:
X-Ray Lithography and Applications of Soft X-Rays to Technology
Alan D. Wilson, Editor(s)

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