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Proceedings Paper

Storage Ring Design For X-Ray Lithography
Author(s): A van Steenbergen; W Grobman
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Paper Abstract

The design of an electron storage ring for Industrial X-ray Lithography is examined and a parameter optimization carried out based on a model lithography system in use at the National Synchrotron Light Source at Brookhaven National Laboratory. In this optimization the potential use of superconducting or permanent magnet wigglers is considered. The basic parameters and geometry of a number of "t(exposure) = 5 sec., X (operating) = 8.26 A" devices are presented.

Paper Details

Date Published: 19 March 1984
PDF: 11 pages
Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); doi: 10.1117/12.939209
Show Author Affiliations
A van Steenbergen, Brookhaven National Laboratory (United States)
W Grobman, IBM, Thomas J. Watson Research Center (United States)

Published in SPIE Proceedings Vol. 0448:
X-Ray Lithography and Applications of Soft X-Rays to Technology
Alan D. Wilson, Editor(s)

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